Electrodeposition of NiFe thin films as buffer layers on semiconductor Si(111) substrates

Gongneng Cailiao/Journal of Functional Materials

Volumn 38, Issue 1, 2007, Pages 81-84

  Jiang, Ying ^a   Yao, Su Wei ^a   Zhang, Wei Guo ^a   Wang, Hong Zhi ^a  

^a TIANJIN UNIVERSITY   (China)

Author keywords

AMR; Electrodeposition; Growth mode; Nanocrystallite; NiFe buffer layer

Indexed keywords

BUFFER LAYERS; ELECTRODEPOSITION; GROWTH (MATERIALS); IRON ALLOYS; MAGNETORESISTANCE; NANOCRYSTALLITES; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; SOLID SOLUTIONS; SURFACE ROUGHNESS; THREE DIMENSIONAL; TWO DIMENSIONAL; X RAY DIFFRACTION ANALYSIS;

ANISOTROPY MAGNETORESISTANCE (AMR); GROWTH MODE; NIFE BUFFER LAYER;

THIN FILMS;

EID: 33947530057     PISSN: 10019731     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. Baibich M N, Broto J M, Fert A, et al.[J]. Physics Review Letters, 1988, 61: 2472-2476.
2. Edward J R, David X Y, Harsh D C.[J]. Applied Physics, 2002, 91(6), 3891-3895.
3. Urbaniak M, Lucinski T, Stobiecki F.[J]. Journal of Magnetism and Magnetic Materials, 1998, 190: 187-192.
4. Parkin S S P, Li Z G, Smith D G.[J]. Applied Physics Letters, 1991, 58, 2710-2712.
5. Parks D C, Chen P J.[J]. Appllied Physics, 2000, 87(6): 3023-3026.
6. Nao Takano, Daisuke Niwa, Taro Yamada, et al.[J]. Electrochimica Acta, 2000, 45(245): 3263-3268.
7. Spada E R, Oliveira L S, Rocha A S, et al.[J]. Journal of Magnetism and Magnetic Materials, 2004, 272: 891-892.
8. Moina C A, Vazdar M.[J]. Electrochemistry communication, 2001, 3: 159-163.
9. Moina C A, Oliveira-Versic L, Vazdar M.[J]. Materials Letters, 2004, 58(27-28): 3518-3522.
10. Gao L J, Ma P, Novogradecz K M, et al.[J]. Journal of Applied Physics, 1997, 81(11), 7595-7599.
11. Xu Ming, Chai Chunlin, Luo Guangming, et al.[J]. Thin Solid Films, 2000, 375: 205-209.
12. Lottis D, Fert A, Morel R, et al.[J]. Applied Physics, 1993, 73(10): 5515-5517.