Low-temperature (∼270°C) growth of vertically aligned ZnO nanorods using photoinduced metal organic vapour phase epitaxy

Nanotechnology

Volumn 18, Issue 6, 2007, Pages

  Yatsui, T ^a   Lim, J ^b   Nakamata, T ^c   Kitamura, K ^c   Ohtsu, M ^a,c   Yi, G C ^d  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL STRUCTURE; LOW TEMPERATURE EFFECTS; METALLORGANIC VAPOR PHASE EPITAXY; SILICON; SINGLE CRYSTALS; ZINC OXIDE;

PHOTOINDUCED METAL ORGANIC VAPOUR PHASE EPITAXY (MOVPE); TEMPERATURE GROWTH; VERTICAL GROWTH;

NANORODS;

NANOROD; SILICON; ZINC OXIDE;

ANALYTIC METHOD; ARTICLE; CRYSTAL STRUCTURE; CRYSTALLIZATION; LIGHT; NANOANALYSIS; PRIORITY JOURNAL; TEMPERATURE;

EID: 33947491826     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/6/065606     Document Type: Article

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