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Volumn 301-302, Issue SPEC. ISS., 2007, Pages 378-380

A novel approach of using a MBE template for ALD growth of high-κ dielectrics

Author keywords

A1. Nucleation; A3. Atomic layer deposition; A3. Molecular beam epitaxy; B1. High ; B1. Oxides; B2. Dielectric materials

Indexed keywords

ATOMIC LAYER DEPOSITION; CURRENT DENSITY; LEAKAGE CURRENTS; MOLECULAR BEAM EPITAXY; NUCLEATION; PERMITTIVITY; THICK FILMS;

EID: 33947327827     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.11.262     Document Type: Article
Times cited : (10)

References (11)
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    • J. Hauser, CVC © 1996 NCSU software, Department Elect. Comput. Eng., North Carolina State University, Raleigh, NC.
  • 3
    • 33947302074 scopus 로고    scopus 로고
    • Bender, H. Conard, H. Nohira, J. Petry, O. Richard, C. Zhao, B. Brijs, W. Besling, C. Detavernier, W. Vandervorst, M. Caymax, S. De Gendt, J. Chen, J. Kluth, W. Tsai, J.W.H. Maes, in: Proceedings of the IWGI, Tokyo, 2001, p. 86.
  • 7
    • 33947330893 scopus 로고    scopus 로고
    • M.L. Huang, T.D. Lin, Y.H. Chang, K.Y. Lee, J. Kwo, M. Hong, unpublished.
  • 9
    • 0001974478 scopus 로고    scopus 로고
    • 2 based dielectrics for future CMOS applications
    • Massoud H.Z., Poindexter E.H., and Helms C.R. (Eds), The Electrochemical Society, Pennington, NJ
    • 2 Interface-III (1996), The Electrochemical Society, Pennington, NJ 3
    • (1996) 2 Interface-III , pp. 3
    • Buchanan, D.A.1    Lo, S.-H.2
  • 11
    • 33947313673 scopus 로고    scopus 로고
    • C.H. Pan, W.C. Lee, L.K. Chu, K.Y. Lee, M.L. Huang, Y.J. Lee, M. Hong, J. Kwo, unpublished.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.