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Volumn 23, Issue 4, 2007, Pages 1619-1622

The wetting of gold and silicon nanoscale arrays

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; GOLD; MATHEMATICAL MODELS; SILICON; SURFACE ROUGHNESS; WETTING;

EID: 33947146674     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0623275     Document Type: Article
Times cited : (6)

References (53)
  • 42
    • 33947168328 scopus 로고    scopus 로고
    • Substrates were cleaned using a degreasing treatment consisting of soaking them in recently boiled 50:50 ethanol/chloroform solution for 5 min followed by 2 min of sonication
    • Substrates were cleaned using a degreasing treatment consisting of soaking them in recently boiled 50:50 ethanol/chloroform solution for 5 min followed by 2 min of sonication.
  • 43
    • 33947131264 scopus 로고    scopus 로고
    • Prepared as per ref 31
    • Prepared as per ref 31.
  • 44
    • 33947118248 scopus 로고    scopus 로고
    • Substrates were placed 1 cm away from a Hg pen lamp (4.5 mW/cm 2) in ambient air for 20 min. Previous experiments and literature reports (see ref 45 for example) have demonstrated the effectiveness of this method in alkanethiol oxidation and subsequent removal from gold surfaces
    • 2) in ambient air for 20 min. Previous experiments and literature reports (see ref 45 for example) have demonstrated the effectiveness of this method in alkanethiol oxidation and subsequent removal from gold surfaces.
  • 46
    • 33947115923 scopus 로고    scopus 로고
    • Nitrogen gas was circulated five times through a saturated solution of potassium carbonate and sent to the humidity chamber (80 mL) for vapor exchange at a flow rate of ∼50 mL/min for at least 2 h. The humidity chamber was placed on top of a temperature-controlled stage set at 25°C
    • Nitrogen gas was circulated five times through a saturated solution of potassium carbonate and sent to the humidity chamber (80 mL) for vapor exchange at a flow rate of ∼50 mL/min for at least 2 h. The humidity chamber was placed on top of a temperature-controlled stage set at 25°C.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.