Lateral growth of poly-Si film by excimer laser and its thin film transistor application

Japanese Journal of Applied Physics

Volumn 33, Issue 1R, 1994, Pages 70-

  Choi, Do Hyun ^a   Sadayuki, Eiichi ^a   Sugiura, Osamu ^a   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; CRYSTAL GROWTH; LASER APPLICATIONS; LIQUID CRYSTAL DISPLAYS; SEMICONDUCTING SILICON;

GLASS SUBSTRATE; LASER CRYSTALLIZATION; LATERAL GROWTH; POLYSILICON;

SEMICONDUCTING FILMS;

EID: 0028207696     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.70     Document Type: Article

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