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Volumn 90, Issue 3, 2007, Pages 932-935

Nucleation and growth of titania nanoparticles prepared by pulsed injection metal organic chemical vapor deposition from a single molecular precursor

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER GAS; GROWTH DYNAMICS; TITANIA NANOPARTICLES; TITANIA PARTICLES; TRANSFORMATION TEMPERATURE;

EID: 33847738975     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2007.01495.x     Document Type: Conference Paper
Times cited : (11)

References (11)
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    • High Anatase-Rutile Transformation Temperature of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition
    • Y. Sun, T. Egawa, L. Zhang, and X. Yao, "High Anatase-Rutile Transformation Temperature of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition," Jpn. J. Appl. Phys., 41, L945-8 (2002).
    • (2002) Jpn. J. Appl. Phys , vol.41
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  • 2
    • 0036973854 scopus 로고    scopus 로고
    • Effect of Collection Distance on the Lattice Structure of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition
    • Y. Sun, T. Egawa, L. Zhang, and X. Yao, "Effect of Collection Distance on the Lattice Structure of Anatase Titania Nanoparticles Prepared by Metalorganic Chemical Vapor Deposition," Jpn. J. Appl. Phys., 41, L1389-92 (2002).
    • (2002) Jpn. J. Appl. Phys , vol.41
    • Sun, Y.1    Egawa, T.2    Zhang, L.3    Yao, X.4
  • 3
    • 0034324537 scopus 로고    scopus 로고
    • High Density, Non-Porous Anatase Titania Thin Films for Device Applications
    • Q. Fan, B. McQuillin, A. K. Ray, M. L. Turner, and A. B. Seddon, "High Density, Non-Porous Anatase Titania Thin Films for Device Applications." J. Phys. D: Appl. Phys., 33, 2683-6 (2000).
    • (2000) J. Phys. D: Appl. Phys , vol.33 , pp. 2683-2686
    • Fan, Q.1    McQuillin, B.2    Ray, A.K.3    Turner, M.L.4    Seddon, A.B.5
  • 4
    • 33847758425 scopus 로고    scopus 로고
    • Numerical Simulation of the Growth of Nanoparticles in a Flame CVD Process
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    • Wang, L.1    Chen, S.2    Xie, H.3
  • 6
    • 0035806006 scopus 로고    scopus 로고
    • Growth Rate and Morphology for Ceramics Films by Pulsed-MOCVD
    • S. Krumdieck and R. Raj, "Growth Rate and Morphology for Ceramics Films by Pulsed-MOCVD," Surf. Coat. Technol., 141, 7-14 (2001).
    • (2001) Surf. Coat. Technol , vol.141 , pp. 7-14
    • Krumdieck, S.1    Raj, R.2
  • 7
    • 0034531549 scopus 로고    scopus 로고
    • 2 Thin Films on Si(100) Substrates Using Single Molecular Precursors by Metal Organic Chemical Vapor Deposition
    • 2 Thin Films on Si(100) Substrates Using Single Molecular Precursors by Metal Organic Chemical Vapor Deposition," Surf. Coat. Technol., 131, 88-92 (2002).
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  • 8
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    • Magnetic Behavior of Cobalt Oxide Films Prepared by Pulsed Liquid Injection Chemical Vapor Deposition From a Metal-Organic Precursor
    • L. M. Apátiga and V. M. Castaño, "Magnetic Behavior of Cobalt Oxide Films Prepared by Pulsed Liquid Injection Chemical Vapor Deposition From a Metal-Organic Precursor," Thin Solid Films, 496, 576-9 (2005).
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    • Apátiga, L.M.1    Castaño, V.M.2
  • 10
    • 0029277646 scopus 로고
    • Growth of Rutile Crystallites During the Initial Stage of Anatase-to-Rutile Transformation in Pure Titania and in Titania-Alumina Nanocomposites
    • K. N. P. Kumar, "Growth of Rutile Crystallites During the Initial Stage of Anatase-to-Rutile Transformation in Pure Titania and in Titania-Alumina Nanocomposites," Scr. Metall. Mater., 32, 873-7 (1995).
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  • 11
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.