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Volumn 101, Issue 2, 2007, Pages
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A thickness modulation effect of HfO2 interfacial layer between double-stacked Ag nanocrystals for nonvolatile memory device applications
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Author keywords
[No Author keywords available]
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Indexed keywords
NANOSTRUCTURED MATERIALS;
PYROLYSIS;
SINGLE CRYSTALS;
SYNTHESIS (CHEMICAL);
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
AG NANOCRYSTALS;
DOUBLE-STACKED LAYERS;
METAL-OXIDE-SILICON STRUCTURES;
HAFNIUM COMPOUNDS;
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EID: 33847721420
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2430785 Document Type: Article |
Times cited : (20)
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References (13)
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