Tantalum plasma etching with minimum effect on underlying nickel-iron thin film

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 381-385

  Hsiao, R ^a   Miller, D ^a   Lin, T ^a   Robertson, N ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Electron spectroscopy; Tantalum

Indexed keywords

ELECTRON SPECTROSCOPY; FLUOROCARBONS; NICKEL ALLOYS; PLASMA ETCHING; TANTALUM; THIN FILMS;

NICKEL FLUORIDE;

METALLIC FILMS;

EID: 0031186223     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00190-9     Document Type: Article

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