Cantilever sensor with stress-concentrating piezoresistor design

Proceedings of IEEE Sensors

Volumn 2005, Issue , 2005, Pages 592-595

  Naeli, Kianoush ^a   Brand, Oliver ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; MICROMACHINING; PARTICLE BEAMS; REACTIVE ION ETCHING; SENSITIVITY ANALYSIS; SILICON; STRESS CONCENTRATION;

ANISOTROPIC WET ETCHING; CANTILEVER SENSORS; PIEZORESISTIVE STRUCTURES; SILICON BEAMS;

SILICON SENSORS;

EID: 33847292895     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2005.1597768     Document Type: Conference Paper

References (6)

1. J. A. Harley and T. W. Kenny, "High-sensitivity piezoresistive cantilevers under 1000 Å thick," Appl. Phys. Lett., vol. 75, pp. 289-291, July 1999.
2. D. Lange, C. Hagleitner, A. Hierlemann, O. Brand, and H. Baltes, "Complementary metal oxide semiconductor cantilever arrays on a single chip: Mass-sensitive detection of volatile organic compounds," Anal Chem., vol. 74, pp. 3084-3095, July 2002.
3. G. Y. Chen, T. Thundat, E. A. Wachter, and R. J. Warmack, "Adsorption-induced surface stress and its effects on resonance frequency of microcantilevers," J. Appl. Phys., vol. 77, pp. 3618-3622, April 1995.
4. P. A. Rasmussen, A. V. Grigorov, and A. Boisen, "Double sided surface stress cantilever sensor," J. Micromech. Microeng., vol. 15, pp. 1088-1091, April 2005.
5. S. D. Senturia, Microsystem Design, Norwell: Kluwer Academic Publishers, 2001, pp.211-213.
6. R. Sunier, P. Monajemi, F. Ayazi, T. Vancura, H. Baltes, and O. Brand, "Precise release and insulation technology for vertical Hall sensors and trench-defined MEMS," in Proc. IEEE Sensors, vol. 3, pp. 1442-1445, Oct 2004.