Correction of random surface roughness on colloidal probes in measuring adhesion

Langmuir

Volumn 23, Issue 3, 2007, Pages 1195-1202

  Yang, Seungho ^a   Zhang, Huan ^a   Hsu, Stephen M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION FORCES; ADHESION MEASUREMENTS; COLLOIDAL PROBES; NANOSCALES;

ADHESION; ATOMIC FORCE MICROSCOPY; NANOSTRUCTURED MATERIALS; PARAMETER ESTIMATION; SILICON COMPOUNDS; SURFACE ROUGHNESS;

SURFACE TREATMENT;

EID: 33847188447     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0622828     Document Type: Article

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