Far-field scattering microscopy applied to analysis of slow light, power enhancement, and delay times in uniform Bragg waveguide gratings

Optics Express

Volumn 15, Issue 4, 2007, Pages 1851-1870

  Hopman, W C L ^a   Hoekstra, H J W M ^a   Dekker, R ^a   Zhuang, L ^a   De Ridder, R M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE SCATTERING; OPTICAL SENSORS; OPTICAL WAVEGUIDES; PHASE SHIFT; REFRACTIVE INDEX;

FAR-FIELD SCATTERING MICROSCOPY (FSCM); INTENSITY DISTRIBUTION; PHASE SHIFT METHOD; TRANSMISSION SPECTRUM;

DIFFRACTION GRATINGS;

EID: 33847148152     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.001851     Document Type: Article

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