Fabrication and characterization of high-quality uniform and apodized Si3N4 waveguide gratings using laser interference lithography

IEEE Photonics Technology Letters

Volumn 18, Issue 17, 2006, Pages 1855-1857

  Hopman, W C L ^a   Dekker, R ^a   Yudistira, D ^a   Engbers, W F A ^a   Hoekstra, H J W M ^a   De Ridder, R M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Electromagnetic scattering by periodic structures; Gratings; Optical device fabrication; Optical waveguide filters; Ridge waveguides

Indexed keywords

APODIZATION FUNCTION; APODIZATIONS; ELECTROMAGNETIC SCATTERING BY PERIODIC STRUCTURES; END-FIRE; HIGH QUALITY; INFRA-RED CAMERAS; LASER INTERFERENCE LITHOGRAPHY; OPTICAL DEVICE FABRICATION; OPTICAL WAVEGUIDE FILTER; Q-VALUES; RESONANCE PEAK; RIDGE WAVEGUIDES; WAVEGUIDE GRATINGS; WAVELENGTH BAND;

CIRCULAR WAVEGUIDES; ELECTROMAGNETIC WAVE SCATTERING; ELECTROMAGNETISM; FABRICATION; OPTICAL INSTRUMENTS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; WAVEGUIDE COMPONENTS;

PERIODIC STRUCTURES;

EID: 33847142821     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2006.881226     Document Type: Article

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