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Volumn 4, Issue , 2005, Pages 1960-1963

Enhanced echographic images obtained improving the membrane structural layer of the cMUT probe

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; CAPACITANCE; IMAGE ANALYSIS; MICROMACHINING; OPTIMIZATION; ULTRASONIC TRANSDUCERS;

EID: 33847144123     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.2005.1603259     Document Type: Conference Paper
Times cited : (23)

References (7)
  • 1
    • 0032162663 scopus 로고    scopus 로고
    • The microfabrication of capacitive ultrasonic transducers
    • X. Jin, I. Ladabaum, and B. T. Khuri-Yakub, "The microfabrication of capacitive ultrasonic transducers," IEEE J. Microelectromech. Syst., Vol. 7, no. 3, pp. 295-302, 1998.
    • (1998) IEEE J. Microelectromech. Syst , vol.7 , Issue.3 , pp. 295-302
    • Jin, X.1    Ladabaum, I.2    Khuri-Yakub, B.T.3
  • 4
    • 21644450947 scopus 로고    scopus 로고
    • Medical imaging with capacitive micromachined ultrasound transducer (cMUT) arrays
    • Montreal, Canada
    • D. M. Mills and L. S. Smith, "Medical imaging with capacitive micromachined ultrasound transducer (cMUT) arrays," in Proc. IEEE Ultrasonics Symposium, Montreal, Canada, 2004.
    • (2004) Proc. IEEE Ultrasonics Symposium
    • Mills, D.M.1    Smith, L.S.2
  • 7
    • 0041541450 scopus 로고
    • Characteristics of silicon nitride deposited by plasma-enhanced chemical vapor deposition using dual frequency radio-frequency source
    • C. W. Pearce, R. F. Fetcho, M. D. Gross, R. F. Koefer and R. A. Pudliner, "Characteristics of silicon nitride deposited by plasma-enhanced chemical vapor deposition using dual frequency radio-frequency source," J. Appl. Phys., 71(4) 1838, 1992.
    • (1992) J. Appl. Phys , vol.71 , Issue.4 , pp. 1838
    • Pearce, C.W.1    Fetcho, R.F.2    Gross, M.D.3    Koefer, R.F.4    Pudliner, R.A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.