Integrated optical nanoprobe sensor implemented using a mixed technology cmos fabrication process

Midwest Symposium on Circuits and Systems

Volumn 2005, Issue , 2005, Pages 778-781

  Ye, Kuntao ^a   Beyette Jr , Fred R ^a  

^a 705 Engineering Research Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; CMOS INTEGRATED CIRCUITS; ELECTRIC CURRENTS; INTEGRATED OPTICS;

PHOTORECEIVER CIRCUITRY; PHOTORECEIVERS; V-GROOVE STRUCTURES;

OPTICAL SENSORS;

EID: 33847130595     PISSN: 15483746     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MWSCAS.2005.1594216     Document Type: Conference Paper

References (6)

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2. Cristea, Dana; Craciunoiu, F.; Modreanu, M.; Caldararu, M.; Cemica, I., "Photonic circuits integrated with CMOS compatible photodetectors", Optical Materials, Vol. 17, Issue: 1-2, June - July, 2001. pp. 201-205.
3. Janet C. Marshall, M. Parameswaran, Mona E. Zaghloul, and Michael Ganan, "High-Level CAD Melds Micromachined Devices with Foundries", Circuits and Devices, November, 1992, pp10-17
4. Michael A. Paesler, Patrick J. Moyer, Near-field Optics Theory, Instrumentation, and Application, chapter 1, 1996
5. Kuntao Ye and Fred R. Beyette Jr., "Characterization of a monolithic silicon MEMS technology in standard CMOS process," presented at SPIE Conference on Optoelectronic Information Processing, Denver CO, August 2001
6. H. Tian, B. Fowler, and A. El Gamal, "Analysis of temporal noise in CMOS APS," Proc. SPIE, Vol. 3649, San Jose, CA, pp. 177-185, Jan. 1999