Modeling of plasma CVD on the inner surface of a microchannel

Thin Solid Films

Volumn 515, Issue 9, 2007, Pages 4197-4202

  Kadowaki, Motoki ^a   Yamamoto, Aguru ^b   Mori, Shinsuke ^a   Suzuki, Masaaki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b The Research Association of Micro Chemical Process Technology (MCPT)   (Japan)

Author keywords

Chemical vapor deposition; Dielectric barrier discharge; Microplasma; Palladium

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; NUMERICAL ANALYSIS; PALLADIUM; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIELECTRIC BARRIER DISCHARGE; GAS VELOCITY; MICROCAPILLARY PLASMA; MODEL SIMULATION;

THIN FILMS;

EID: 33847060498     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.056     Document Type: Article

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