Electrochromic WO3-x films with reduced lattice deformation stress and fast response time

Electrochimica Acta

Volumn 52, Issue 11, 2007, Pages 3541-3549

  Hepel, Maria ^a,b   Redmond, Haley ^a   Dela, Indeewari ^a  

^a STATE UNIVERSITY OF NEW YORK AT POTSDAM   (United States)

^b UNIVERSITY AT BUFFALO   (United States)

Author keywords

Electrochromic properties; EQCN stress measurement; Intercalation; Isotopic effect; WO3 deposition etching; WO3 lattice deformation

Indexed keywords

CRYSTALLOGRAPHY; DEFORMATION; ELECTROCHEMISTRY; ELECTROCHROMISM; ETCHING; QUARTZ; STRESS ANALYSIS; TUNGSTEN COMPOUNDS;

ELECTROCHROMIC PROPERTIES; EQCN STRESS MEASUREMENT; ISOTOPIC EFFECT; WO3 DEPOSITION/ETCHING; WO3 LATTICE DEFORMATION;

THIN FILMS;

EID: 33847046078     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2006.10.032     Document Type: Article

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