Photoelectrochemical properties of nanostructured tungsten trioxide films

Journal of Physical Chemistry B

Volumn 105, Issue 5, 2001, Pages 936-940

  Santato, Clara ^a   Ulmann, Martine ^a   Àugustynski, Jan ^a  

^a UNIVERSITY OF GENEVA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; HEAT TREATMENT; METHANOL; NANOSTRUCTURED MATERIALS; PHOTOCURRENTS; PHOTOOXIDATION;

PHOTOELECTROCHEMICAL PROPERTIES; TUNGSTEN TRIOXIDE;

TUNGSTEN COMPOUNDS;

EID: 0035249910     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp002232q     Document Type: Article

References (30)

1. (a) Modes, G.; Cahen, D.; Manassen, J. Nature 1976, 26, 312.
2. (b) Hardee, K. L.; Bard, A. J. J. Electrochem. Soc. 1977,124,215.
3. Gissler, W.; Memming, R. J. Electrochem. Soc. 1977, 124, 1710.
4. Derrington, C. E.; Godek, W. S.; Castro, C. A.; Wold, A. Inorg. Chem. 1978,17, 977.
5. (e) Gerrard, W. A. J. Electroanal. Chem. 1978, So, 421.
6. (f) Reichman, B.; Bard, A. J. J. Electrochem. Soc. 1979, 726,2133.
7. (g) Di Quarto, F.; Russo, G.; Sunseri, C.; Di Paola, A. J. Chem. Soc., Faraday Trans. I 1982, 78, 3433.
8. (h) Ulmann, M.; Augustynski, J. In Photoelectrochemistry: Fundamental Processes and Measurement Techniques edited by W. L. Wallace, A. J. Nozik, S. K. Deb, and R. H. Wilson (The Electrochemical Society, Pennington, NJ, 1982, pp 663-672).
9. Spichiger-Uimann, M.; Augustynski, J. J. Appl. Phys. 1983, 54, 6061.
10. (a) Butler, M. A.; Nasby, R. D.; Quinn, R. K. Solid Slate Commun. 1976, 19, 1011.
11. (b) Butler, M. A. J. Appl. Phys. 1977, 48, 1914.
12. Bedja, I.; Hotchandani, S.; Carpantier, R.; Vinodgopal, K.; Kamat, P. V. Thin Solid Films 1994, 247, 195.
13. (a) Shiyanovskaya, I.; Hepel, M. J. Electrochem. Soc. 1998, 145, 3981.
14. (b) Shiyanovskaya, I.; Hepel, M. J. Elecirochem. Soc. 1999, 146, 243.
15. (a) Richardson, E. J. Inorg. Nucl. Chem. 1959, 12, 79.
16. (b) Chemseddine, A.; Babonneau, F.; Livage, J. J. Non-Cryst. Solids 1987, 91, 271.
17. Augustynski, J.; Ulmann, M.; Santato, C. Patent pending WO9967181.
18. Loopstra, B. O.; Rietveld, H. M. Ada Crystallogr. 1969, B25, 1420.
19. (a) Wahl, A.; Ulmann, M.; Carroy, A.; Augustynski, J. J. Chem. Soc., Chem. Commun. 1994, 2277.
20. (b) Wahl, A.; Ulmann, M.; Carroy, A.; Jermann, B.; Dolata, M.; Kedzierzawski, P.; Chatelain, C.; Monnier, A.; Augustynski, J. J. Eleclroanal. Chem. 1995, 396, 41.
21. Ulmann, M.; De Tacconi, N. R.; Augustynski, J. J. Phys. Chem. 1986, 90, 6523.
22. 3 colloids was followed by Nenadovic M. T., Rajh T., Micic O. I., Nozik A. J. (J. Phys. Chem. 1984, 88, 5827) through their absorption spectrum at λ > 700 nm. Although the observed initial rate of oxygen reduction was significant in the presence of large concentrations of electrons injected into WOj, it became quite low for smaller e~ concentrations.
23. Vinodgopal, K.; Bedja, I.; Kamat, P. V. Chem. Mater. 1996, 8, 2180.
24. Khan, S. U. M.; Akikusa, J. J. Phys. Chem. B 1999, 103, 7184.
25. (a) Morrison, S. R.; Freund, T. J. Chem. Phys. 1967, 47, 1543.
26. (b) Freund, T.; Gomes, W. P. Catal. Rev. 1969, 3, 1.
27. Breitenkamp, M.; Henglein, A.; Lilie, J. Ber. Bunsen-Ges. Phys. Chem. 1976,50,973.
28. (a) Léaustic, A.; Babonneau, F.; Livage, J. J. Phys. Chem. 1986, 90, 4193.
29. (b) Léaustic, A.; Babonneau, F.; Chemseddine, A.; Livage, J. New. J. Chem. 1989, 13, 111.
30. 3, pH = 0.4; cf. El Wakkad, R. K. S.; Risk, H. A. J. Phys. Chem. 1957, 61, 494 and ref 15b.