Non-contact, image-based photoluminescence metrology for ion implantation and annealing process inspection

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 566-569

  Buczkowski, Andrzej ^a   Li, Zhiqiang ^a   Walker, Tom ^a   Hummel, Steven G ^a   Borland, John O ^b  

^a Accent Optical Technologies   (United States)

^b JOB Technologies   (United States)

Author keywords

As implanted; Metrology; Photoluminescence; Ultra shallow junction

Indexed keywords

EID: 33846987902     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401581     Document Type: Conference Paper

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