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Volumn 3, Issue 3, 2006, Pages 171-180

Depth profiling of chemical and electronic structures and defects of ultrathin HfSiON on Si(100)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRONIC STRUCTURE; PYROLYSIS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEFECT STATE DENSITY; DEPTH PROFILING; PHOTOELECTRON YIELD SPECTROSCOPY (PYS); PLASMA NITRIDATION;

HAFNIUM COMPOUNDS;

EID: 33846970245 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.2355709 Document Type: Conference Paper

Times cited : (7)

References (10)

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- M. R. Visokay, J. J. Chambers, C. H. Chen, A. L. P. Rotondaro, A. Shanware and L. Colombo: Appl. Phys. Lett. 80, 3188 (2002).
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6
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.