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Volumn 3, Issue 7, 2006, Pages 1175-1180

Halide passivation of germanium nanaowires

Author keywords

[No Author keywords available]

Indexed keywords

HALOGEN COMPOUNDS; HYDROCHLORIC ACID; OXIDATION; PASSIVATION; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR GROWTH; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33846964912     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2355911     Document Type: Conference Paper
Times cited : (15)

References (23)
  • 9
    • 32844455518 scopus 로고    scopus 로고
    • J. Kim, K. Saraswat and Y. Nishi, ECS Transactions SO - Cleaning Technology in Semiconductor Device Manufacturing IX; 2005; v.1; p.214-219 and 9th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing - 2005 Fall Meeting of the Electrochemical Society; Oct 16-21 2005; Los Angeles, CA, United States, 1, 214 (2005).
    • J. Kim, K. Saraswat and Y. Nishi, ECS Transactions SO - Cleaning Technology in Semiconductor Device Manufacturing IX; 2005; v.1; p.214-219 and 9th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing - 2005 Fall Meeting of the Electrochemical Society; Oct 16-21 2005; Los Angeles, CA, United States, 1, 214 (2005).
  • 22
    • 33846975778 scopus 로고    scopus 로고
    • Jelight UVO-CLEANER MODEL 42, Low Pressure Mercury Vapor Grid Lamp with and output of 28,000 Micro Watts Per Cm2 @ 254 nm (from 6mm distance)
    • Jelight UVO-CLEANER MODEL 42, Low Pressure Mercury Vapor Grid Lamp with and output of 28,000 Micro Watts Per Cm2 @ 254 nm (from 6mm distance)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.