Defect behavior in BF2 implants for S/D applications as a function of ion beam characteristics

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 133-136

  Cagnat, Nathalie ^a   Laviron, Cyrille ^b   Auriac, Nicolas ^c   Liu, Jinning ^d   Mehta, Sandeep ^d   Frioulaud, Laurent ^a   Mathiot, Daniel ^e  

^a STMICROELECTRONICS   (France)

^b CEA LETI   (France)

^c FREESCALE SEMICONDUCTOR INC   (United States)

^d VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

^e Faculté de Médecine   (France)

Author keywords

Defects; Ion beam; Ion implantation

Indexed keywords

EID: 33846945046     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401479     Document Type: Conference Paper

References (4)

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4. Moroz, V., and Martin-Bragado, I., MRS Spring Proceeding, 2006.