Low dielectric loss BaNd2Ti5O14 thick films prepared by an electrophoretic deposition technique

Applied Physics Letters

Volumn 90, Issue 5, 2007, Pages

  Fu, Zhi ^a   Wu, Aiying ^a   Vilarinho, P M ^a   Kingon, A I ^b   Wordenweber R ^c  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPHORETIC DEPOSITION (EPD); MICROWAVE COMMUNICATION DEVICES; MICROWAVE MEASUREMENTS;

BARIUM COMPOUNDS; DIELECTRIC LOSSES; ELECTRODEPOSITION; ELECTROPHORESIS; METAL FOIL; PERMITTIVITY; PLATINUM; THERMODYNAMIC STABILITY;

THICK FILMS;

EID: 33846941528     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2435334     Document Type: Article

References (16)

1. Y. B. Xu, Y. Y. He, X. M. Cheng, X. B. Zhang, and L. B. Wang, J. Mater. Sci.: Mater. Electron. 13, 197 (2002).
2. R. J. Cava, W. F. Peck, Jr., J. J. Krajewski, G. L. Roberts, B. P. Barber, H. M. O'Bryan, and P. L. Gammel, Appl. Phys. Lett. 70, 1396 (1997).
3. D. Kolar, Z. Stadler, S. Gaberscek, and D. Suvorov, Ber. Dtsch. Keram. Ges. 55, 346 (1978).
4. R. Uboc, I. M. Reaney, and W. E. Lee, Int. Mater. Rev. 43, 205 (1998).
5. H. F. Cheng, Y. C. Chen, and I. N. Lin, J. Appl. Phys. 87, 479 (2000).
6. P. Sarkar and P. Nicholson, J. Am. Ceram. Soc. 79, 1987 (1996).
7. J. P. Zhang and B. I. Lee, J. Am. Ceram. Soc. 83, 2417 (2000).
8. E. Ngo, P. C. Joshi, M. W. Cole, and C. W. Hubbard, Appl. Phys. Lett. 79, 248 (2001).
9. J. Van Tassel and C. A. Randall, J. Eur. Ceram. Soc. 19, 955 (1999).
10. A. Y. Wu, P. M. Vilarinho, and A. I. Kingon, J. Am. Ceram. Soc. 89, 575 (2006).
11. W. J. Borland and S. Ferguson, Circuit Tree (March 2001).
12. Natl. Bur. Stand. (U.S.) Monogr. 25,19 19 (1982); JCPDS-International Center for Diffraction Data Card No. 33-0166.
13. JCPDS-International Center for Diffraction Data Card No. 33-0166.
14. Y. H. Choi and J. C. Lww, Thin Solid Films 385, 43 (2001).
15. J. D. Baniecki, R. B. Laibowitz, T. M. Shaw, P. R. Duncombe, D. A. Neumayer, D. E. Kotecki, H. Shen, and Q. Y. Ma, Appl. Phys. Lett. 72, 498 (1998).
16. P. C. Joshi and S. B. Desu, Appl. Phys. Lett. 73, 1080 (1998).