An atomic interaction-based continuum model for adhesive contact mechanics

Finite Elements in Analysis and Design

Volumn 43, Issue 5, 2007, Pages 384-396

  Sauer, Roger A ^a   Li, Shaofan ^a  

^a Berkeley   (United States)

Author keywords

Adhesive contact; Computational contact mechanics; Continuum mechanics; Interatomic potential; JKR theory; Nano mechanics; Scaling

Indexed keywords

ADHESIVES; COMPUTATIONAL METHODS; FINITE ELEMENT METHOD; LAGRANGE MULTIPLIERS; MATHEMATICAL MODELS;

ADHESIVE CONTACT; COMPUTATIONAL CONTACT MECHANICS; INTERATOMIC INTERACTION; INTERATOMIC POTENTIAL; JKR THEORY; NANOMECHANICS; SCALING;

CONTINUUM MECHANICS;

EID: 33846933719     PISSN: 0168874X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.finel.2006.11.009     Document Type: Article

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