On the reliability of scanning probe based electrostatic force measurements

Microelectronic Engineering

Volumn 84, Issue 3, 2007, Pages 512-516

  Ratzke, Markus ^a   Reif, Jürgen ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electrostatic force microscopy; Resolution; Silicon

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; FINITE ELEMENT METHOD; MICROSCOPIC EXAMINATION; PARAMETER ESTIMATION; SCANNING;

ELECTROSTATIC FORCE MEASUREMENTS; ELECTROSTATIC FORCE MICROSCOPY; SCANNING KELVIN PROBE MICROSCOPY (SKM); SPATIAL INHOMOGENEITIES;

SEMICONDUCTOR DEVICES;

EID: 33846933463     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.079     Document Type: Article

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