Development, characterisation and rapid evaluation of standard enthalpies of vaporisation and fusion of volatile Bis(N - R-salicylaldimine)nickel(II) (n - R = methyl to pentyl) complexes for its MOCVD applications

Chemical Engineering Science

Volumn 62, Issue 6, 2007, Pages 1703-1711

  Arockiasamy, S ^a   Sreedharan, O M ^a   Mallika, C ^b   Raghunathan, V S ^b   Nagaraja, K S ^a  

^a LOYOLA COLLEGE   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

CVD of metallic nickel; Ni precursors; TG DTA studies; Thermodynamic process; Vapor pressures; Volatile complexes

Indexed keywords

COMPLEXATION; ENTHALPY; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; VAPOR PRESSURE; VAPORIZATION;

METALLIC NICKEL; NI PRECURSORS; THERMODYNAMIC PROCESSES; VOLATILE COMPLEXES;

ORGANOMETALLICS;

COMPLEXATION; ENTHALPY; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; VAPOR PRESSURE; VAPORIZATION;

EID: 33846814978     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2006.12.001     Document Type: Article

References (30)

1. Anthony C.J. MOCVD of electroceramic oxides: a precursor manufacturer's perspective. Chemical Vapor Deposition 4 5 (1998) 169-179
2. Anthony C.J. Molecular design of improved precursors for the MOCVD of electro ceramic oxides. Journal of Materials Chemistry 12 (2002) 2576-2590
3. ′ ethylenebis(2,4-pentanedion-iminoato)nickel(II) by a TG-based Transpiration Method. Materials Letters 58 (2004) 2256-2260
4. Antonypremkumar, P., Nagaraja, K.S., Kuppusamy, P., Dasgupta, A., Mallika, C., Raghunathan, V.S., Baldev, R., 2005. A glow discharge plasma based CVD technology for the production of CrN coatings and composite coatings of CrN and Ni. Indian Patent Application Number CHE/272.
5. Antonypremkumar P., Dasgupta A., Kuppusamy P., Parameswaran P., Mallika C., Nagaraja K.S., and Raghunathan V.S. Synthesis and characterisation of Ni and Ni/CrN nanocomposite coatings by plasma assisted metal-organic CVD. Chemical Vapour Deposition 12 (2006) 39-46
6. ′-ethylenebis(2,4-pentanedion-iminoato)nickel(II) complex from melting point depression using bis(2,4-pentanedionato)nickel(II) as non-volatile solute. Materials Letters 59 (2005) 1334-1337
7. ′-propylenebis(2,4-pentanedion-iminoato)nickel(II) for CVD applications. Journal of Materials Science 41 (2006) 3383-3390
8. Arockiasamy, S., Sreedharan, O.M., Mallika, C., Raghunathan, V.S., Nagaraja, K.S., 2006b. Fast atom bombardment mass spectral studies on volatile bis(N - R-salicylaldimine)nickel(II) (where n - R = methyl to pentyl) complexes and identification of peaks due to Ni bearing aggregated species. Annual IIT Madras Chemistry Symposium & The First Mid-Year Meeting of the Chemical Research Society of India, July 12-13, p. 74.
9. Brissonneau L., and Vahlas C. Precursors and operating conditions for the metal-organic chemical vapour deposition of nickel films. Annales de Chimie Scencedes Matėriaux 25 (2000) 81-90
10. Caturla F., Molina F., Sabio M., and Rodriguez F. Electroless plating of Graphite with Copper and nickel. Journal of Electrochemical Society 142 12 (1995) 4084-4090
11. Charles R.G., and Pawlikowski M.A. Comparative heat stabilities of some metal acetylacetonate chelates. Journal of Physical Chemistry 62 (1958) 440-444
12. Cole M.W., Hubbard C., Fountzoulas C.G., Demaree D., Natarajan A., Miller R.A., Zhu D., and Xie K. The reliability of Ni contacts to n-SiC subjected to pulsed thermal fatigue. Electrochemical and Solid-State Letters 2 2 (1999) 97-99
13. Crofton J., McMillan P.G., Williams J.R., and Bozack M.J. High temperature ohmic contact to n-type 6H-SiC using nickel. Journal of Applied Physics 77 3 (1995) 1317-1319
14. 3], Ln = Y, Gd. European Journal of Inorganic Chemistry, 1169-1174.
15. Karvankova P., Mannling H.D., Eggs C., and Veprek S. Thermal stability of ZrN-Ni and CrN-Ni super hard nanocomposite coatings. Surface and Coatings Technology 146-147 (2001) 280-285
16. Kuppusami, P., Dasgupta, A., Sreedharan, O.M., Lawrence, F., Raghunathan, V.S., Baldev, R., Nagaraja, K.S., Antonypremkumar, P., 2001. An improved process for hard chromium nitride coating on substrates and a coated substrates so obtained. Indian Patent Application Number, MUM/637.
17. Leonov M.R., Ilyushenkov V.A., and Kiselev N.I. Preparation of two-layer coatings containing uranium or thorium dioxide and metallic nickel. Radiochemistry 39 3 (1997) 239-242
18. Maruyama T., and Tago T. Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate. Journal of Materials Science 28 (1993) 5345-5348
19. Maury F. Trends in precursor selection for MOCVD. Chemical Vapour Deposition 2 3 (1996) 113-116
20. 60 by a transpiration method using a horizontal thermo balance. Thermochimica Acta 316 (1998) 101-108
21. Pankajavalli R., Mallika C., Sreedharan O.M., Raghunathan V.S., Antonypremkumar P., and Nagaraja K.S. Thermal stability of organo-chromium or chromium organic complexes and vapour pressure measurements on tris(2,4-pentanedionato)chromium(III) and hexacarbonyl chromium(0) by TG-based transpiration method. Chemical Engineering Science 57 (2002) 3603-3610
22. Price D.M. Vapor pressure determination by thermogravimetry. Thermochimica Acta 367-368 (2001) 253-262
23. Price D.M. Volatilisation, evaporation and vapour pressure studies using thermobalance. Journal of Thermal Analysis and Calorimetry 64 (2001) 315-322
24. Price D.M., and Hawkins M. Vapour pressures of hydroxybenzophenone UV absorbers. Thermochimica Acta 329 (1999) 73-76
25. Price D.M., Bashir S., and Derrick P.R. Sublimation properties of x, y-dihydroxybenzioc acid isomers as model matrix assisted laser desorption ionization (MALDI) matrices. Thermochimica Acta 327 (1999) 167-171
26. Reisman A. Phase Equilibria vol. 19 (1999), Academic Press, New York
27. Sacconi L., Paoletti P., and Guiseppe D.R. Studies in coordination chemistry. I. The effect of solvents on some Bis-(N-alkylsalicylaldimine)-nickel (II) complexes. Journal of American Chemical Society 79 (1957) 4062-4067
28. Van Mol A.M.B., Driessen J.P.A.M., Linden J.L., de Croon M.H.J.M., Spee C.I.M.A., and Schouten J.C. Vapor pressures of precursors for the CVD of titanium nitride and tin oxide. Chemical Vapour Deposition 7 3 (2001) 101-104
29. Wood J.L., and Jones M. Heats of formation and coordinate bond energies of some nickel (II) chelates. Journal of Physical Chemistry 67 (1963) 1049-1051
30. Wu F.B., Li J.J., and Duh J.G. Evaluation of the mechanical properties and tribological behavior of the CrN coating deposited on mild steel modified with an electroless Ni interlayer. Thin Solid Films 377-378 (2000) 354-359