ALD for data storage applications

ECS Transactions

Volumn 1, Issue 10, 2006, Pages 37-47

  Mao, M ^a   Bubber, R ^a   Schneider, T ^a  

^a VEECO INSTRUMENTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ELECTROCHEMISTRY; FILM GROWTH; MAGNETIC RECORDING; THERMAL EFFECTS;

ATOMIC LAYER DEPOSITION (ALD); GROWTH RATE; MAGNETIC RECORDING HEADS;

DATA STORAGE EQUIPMENT;

EID: 33846807861     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2209328     Document Type: Conference Paper

References (14)

1. T. Suntola , Thin Solid Films, 216, 84 (1992).
2. R.G. Gordon, J. Becker, D. Hausmann and E. Kim, ALD conference 2002, Seoul, Korea.
3. A .Paranjpe, S.Gopinath, T. Omstead and R. Bubber, J. Electrochem. Soc. 148, 0465(2001).
4. J.G. S Simmons,J. Appl. Phys. 34, 1793 (1963).
5. H. Lefakis, M. Benaissa, P. Humbert, V. S. Speriosu, J. Werckmann and B. A. Gurnay, J. MMM, 17, 154(1996).
6. C.-Y. Hung, M. Mao, S. Funada, T. Schneider, L. Miloslavsky, M. Miller, H.-C. Tong, J. Appl. Phys. 87, 6618(2000).
7. D. Hausmann, J. Becker, S. Wang, and R.G. Gordon, Science, 298, 402(2002).
8. R. Bubber, M. Mao and T. Schneider, AID conference 2004, Helsinki, Finland.
9. R. Bubber, M. Mao, T. Schneider, H. Hegde, K. Sin, S. Funada and S. Shi, IEEE Trans. Magn. 38, 2724(2002).
10. R. Bubber, M. Mao, T. Schneider and H. Hegde, Diskcon 2001, San Jose, USA.
11. M. Putkonen, M. Nieminen and L. Niinistö, Thin Solid Films, 466, 103(2004).
12. M.-C. Cyrille, F.H. Dill, C. Hwang and J.-L. Li USPTO patent US6858909B2.
13. A. Baer, M.-C. Cyrille, F.H. Dill, B.L.C. Wang, C. Hwang and M. Pinarbasi, USPTO application publication US20050067374A1.
14. H. Hegde, M. Mao, B. Druz and A. Devasahayam, Patent pending.