Advanced manufacturing rules check (MRC) for fully-automated assessment of complex reticle designs - Part II

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Straub, J A ^a   Aguilar, D ^a   Buck, P D ^a   Dawkins, D ^a   RGladhill, ^a   Nolke, S ^a   Riddick, J ^a  

^a Toppan Photomasks Inc   (United States)

Author keywords

Defect inspection; Design for manufacturing; Manufacturing rules check; Mask data inspection; Mask data preparation; MRC

Indexed keywords

INSPECTION; LITHOGRAPHY; OPTICAL DESIGN; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICS;

DEFECT INSPECTION; ELECTRONIC DESIGN AUTOMATION (EDA); MANUFACTURING RULES CHECK (MRC); MASK DATA INSPECTION; MASK DATA PREPARATION;

MASKS;

EID: 33846637889     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686134     Document Type: Conference Paper

References (4)

1. R. Gladhill, et al, "Advanced manufacturing rules check (MRC) for fully-automated assessment of complex reticle designs", Proceedings of SPIE Vol. 5992, J. T. Weed and P. M. Martin, 2005.
2. C. H. Howard, et al, "Using Manufacturing Rule Check to pre-screen Reticle Inspection databases", Proceedings of SPIE Vol. 4186, B. J. Grenon and G. T. Dao, pp. 119-128, 2001.
3. M. Keck, et al, "Mask Manufacturing Rule Check: How to Save Money in Your Mask Shop", Proceedings of SPIE Vol. 4186, B. J. Grenon and G. T. Dao, pp. 114-118, 2001.
4. J. McCall, et al, "Integrated Method of Mask Data Checking and Inspection Data Prep for Manufacturable Mask Inspection: Inspection Rule Violations", Proceedings of SPIE Vol.4562, G. T. Dao and B. J. Grenon, pp. 161-170, 2002