Integrated method of mask data checking and inspection data prep for manufacturable mask inspection: Inspection rule violations

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 161-170

  McCall, Joan ^a   Reddy, Vinod ^a   Kim, Hyung Min ^a   Babasa, Mark ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Data Prep; Do Not Inspect Region (DNIR); Inspection Rule Violation (IRV); Mask Inspection

Indexed keywords

DATA HANDLING; DATA REDUCTION; DISTANCE MEASUREMENT; ERROR CORRECTION; FEATURE EXTRACTION; INSPECTION; KNOWLEDGE BASED SYSTEMS;

MASK DATA CHECKING;

MASKS;

EID: 0035767822     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458288     Document Type: Article

References (2)

1. M. Keck et al., "Mask manufacturing rule check: How to save money in your mask shop", Proceedings of SPIE 4186, B.J. Grenon and G.T. Dao, pp. 114-118, 2001.
2. C.H. Howard, et al., "Using Manufacturing Rule Check to pre-screen Reticle Inspection databases", Proceedings of SPIE Vol. 4186, B.J. Grenon and G.T. Dao, pp. 119-128, 2001.