Growth of carbon nanotubes by atmospheric pressure plasma enhanced chemical vapor deposition using NiCr catalyst

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5378-5382

  Kyung, Se Jin ^a   Voronko, Maksym ^a   Lee, Yong Hyuk ^b   Kim, Chan Woo ^b   Lee, June Hee ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

^b Samsung SDI   (South Korea)

Author keywords

Carbon nanotubes(CNTs); Field emission; PECVD

Indexed keywords

CARBON NANOTUBES; CATALYSTS; CRYSTAL GROWTH; DEFECTS; ELECTRIC PROPERTIES; FIELD EMISSION MICROSCOPES; NICKEL ALLOYS; PHYSICAL PROPERTIES; SUBSTRATES;

FIELD EMISSION DEVICES; NICKEL ALLOYS CATALYST; SUBSTRATE TEMPERATURES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBES; CATALYSTS; CRYSTAL GROWTH; DEFECTS; ELECTRIC PROPERTIES; FIELD EMISSION MICROSCOPES; NICKEL ALLOYS; PHYSICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES;

EID: 33846622958     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.191     Document Type: Article

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