SCOPUS 정보 검색 플랫폼

Volumn 80, Issue 12, 2002, Pages 2171-2173

Precise control of multiwall carbon nanotube diameters using thermal chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

CARBON MATERIAL; NI FILMS; OUTER DIAMETERS; PRECISE CONTROL; RUTHERFORD BACK-SCATTERING SPECTROMETRY; THERMAL CHEMICAL VAPOR DEPOSITION;

ACETYLENE; ATMOSPHERIC PRESSURE; CARBON; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 79956023012 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1463204 Document Type: Article

Times cited : (63)

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