Photomask process development for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 277-288

  Sasaki, Shiho ^a   Itoh, Kimio ^a   Fujii, Akiko ^a   Toyama, Nobuhito ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Higher resolution; Imprint; IX masks; Mold

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER;

EB TOOLS; HIGHER RESOLUTION; IMPRINT; IX MASKS;

PHOTOLITHOGRAPHY;

EID: 28544440762     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617462     Document Type: Conference Paper

References (4)

1. International Technology Roadmap for Semiconductor, 2004 update, http://public.itrs.net/
2. Shinji Masui, "Nano-imprint gijutu tettei kaisetsu", Electronic Jounal, p.20, 2004, in Japanese.
3. I McMackin, P. Schumaker, D. Babbs, J. Choi, W. Collison, S.V. Sreenivasan, N. Schumaker, M. Watts, R. Voisin, "Design and performance of a step and repeat imprinting machine", Proc. of SPIE, vol. 5037, pp. 178-186, 2003.
4. S.C. Johnson, T.C. Bailey, M.D. Dickey, B.J. Smith, E.K. Kim, A.T. Jamieson, N.A. Stacey, J.G. Ekerdt, C.G. Willson, D.P. Mancini, W.J. Dauksher, K.J. Nordquist, D.J. Resnick, "Advances in step and flash imprint lithography", Proc. of SPIE, vol. 5037, pp. 197-202, 2003.