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Volumn 22, Issue 26, 2006, Pages 11400-11404
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Improved silicon nitride surfaces for next-generation microarrays
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL MECHANICAL POLISHING;
CHEMICAL VAPOR DEPOSITION;
FLUORESCENCE;
GENES;
INTEGRATED CIRCUITS;
SILICON NITRIDE;
FLUORESCENT INTENSITY;
MICROARRAYS;
POSITIVE CONTROL GENES;
SILICON NITRIDE SURFACES;
SURFACE TREATMENT;
SILICON DERIVATIVE;
SILICON NITRIDE;
ARTICLE;
CHEMISTRY;
DNA MICROARRAY;
FLUORESCENCE;
METHODOLOGY;
FLUORESCENCE;
OLIGONUCLEOTIDE ARRAY SEQUENCE ANALYSIS;
SILICON COMPOUNDS;
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EID: 33846382691
PISSN: 07437463
EISSN: None
Source Type: Journal
DOI: 10.1021/la060489v Document Type: Article |
Times cited : (10)
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References (16)
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