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Volumn 21, Issue 12, 2006, Pages 2971-2974

The influence of porosity on whisker growth in electroplated tin films

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; ELECTROPLATED PRODUCTS; FILM GROWTH; METALLOGRAPHIC MICROSTRUCTURE; POROSITY; SOLDERING ALLOYS;

EID: 33846332741     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0368     Document Type: Article
Times cited : (9)

References (19)
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    • (NEMI Tin Whisker Modeling Project)
    • G.T. Galyon: Annotated tin whisker bibliography and anthology. (NEMI Tin Whisker Modeling Project, 2003), pp. 1-21.
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    • Galyon, G.T.1
  • 3
    • 0742330846 scopus 로고    scopus 로고
    • Lead-free tin alloys - Laboratory curiosities or capable processes
    • M. Jordan: Lead-free tin alloys - Laboratory curiosities or capable processes. Metal Finishing 101, 8 (2003).
    • (2003) Metal Finishing , vol.101 , pp. 8
    • Jordan, M.1
  • 4
    • 0000168193 scopus 로고
    • Grain size effect of electro-plated tin coatings on whisker growth
    • T. Kakeshita, K. Shimizu, R. Kawanaka, and T. Hasegawa: Grain size effect of electro-plated tin coatings on whisker growth. J. Mater. Sci. 17, 2560 (1982).
    • (1982) J. Mater. Sci. , vol.17 , pp. 2560
    • Kakeshita, T.1    Shimizu, K.2    Kawanaka, R.3    Hasegawa, T.4
  • 6
    • 0034921084 scopus 로고    scopus 로고
    • Minimization of tin whisker formation for lead-free electronics finishing
    • R. Schetty: Minimization of tin whisker formation for lead-free electronics finishing. Circuit World 27, 17 (2001).
    • (2001) Circuit World , vol.27 , pp. 17
    • Schetty, R.1
  • 7
    • 0037999858 scopus 로고    scopus 로고
    • Electron microscopy study of tin whisker growth
    • J.B. LeBret and M.G. Norton: Electron microscopy study of tin whisker growth. J. Mater. Res. 18, 585 (2003).
    • (2003) J. Mater. Res. , vol.18 , pp. 585
    • LeBret, J.B.1    Norton, M.G.2
  • 9
    • 0032083872 scopus 로고    scopus 로고
    • Spontaneous growth mechanism of tin whiskers
    • B.Z. Lee and D.N. Lee: Spontaneous growth mechanism of tin whiskers. Acta Mater. 46, 3701 (1998).
    • (1998) Acta Mater. , vol.46 , pp. 3701
    • Lee, B.Z.1    Lee, D.N.2
  • 10
    • 20344380936 scopus 로고    scopus 로고
    • An integrated theory of whisker formation: The physical metallurgy of whisker formation and the role of internal stresses
    • T.G. Galyon and L. Palmer: An integrated theory of whisker formation: The physical metallurgy of whisker formation and the role of internal stresses. IEEE Transactions on Electronics Packaging and Manufacturing 28, 17 (2005).
    • (2005) IEEE Transactions on Electronics Packaging and Manufacturing , vol.28 , pp. 17
    • Galyon, T.G.1    Palmer, L.2
  • 11
    • 0020125253 scopus 로고
    • Kinetics of interfacial reaction in bimetallic Cu-Sn thin films
    • K.N. Tu and R.D. Thompson: Kinetics of interfacial reaction in bimetallic Cu-Sn thin films. Acta Metall. 30, 947 (1982).
    • (1982) Acta Metall. , vol.30 , pp. 947
    • Tu, K.N.1    Thompson, R.D.2
  • 12
    • 1942423552 scopus 로고    scopus 로고
    • Characteristics of tin whiskers formed on sputter-deposited films - An aging study
    • J.P. Winterstein, J.B. LeBret, and M.G. Norton: Characteristics of tin whiskers formed on sputter-deposited films - an aging study. J. Mater. Res. 19, 689 (2004).
    • (2004) J. Mater. Res. , vol.19 , pp. 689
    • Winterstein, J.P.1    LeBret, J.B.2    Norton, M.G.3
  • 13
    • 0007851946 scopus 로고
    • Preferred orientations in electro-deposited metals
    • N.A. Pangarov: Preferred orientations in electro-deposited metals. J. Electroanal. Chem. 9, 70 (1965).
    • (1965) J. Electroanal. Chem. , vol.9 , pp. 70
    • Pangarov, N.A.1
  • 14
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    • Effect of Cu stud microstructure and electroplating process on intermetallic compounds growth and reliability of flipchip solder bump
    • G-W. Xiao: Effect of Cu stud microstructure and electroplating process on intermetallic compounds growth and reliability of flipchip solder bump. IEEE Transactions on Components and Packaging Technologies 24, 682 (2001).
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  • 16
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    • Residual stresses and cracking in metal/ceramic systems for microelectronics packaging
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    • Hsueh, C.H.1    Evans, A.G.2
  • 17
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    • Rickerby, D.S.1    Burnett, P.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.