Optimization of the chemical vapor deposition induced focused ion beam

Key Engineering Materials

Volumn 291-292, Issue , 2005, Pages 413-418

  Choi, H Z ^a   Kang, E G ^a   Lee, S W ^a   Hong, W P ^a  

^a Korea Institute of Industrial Technology   (South Korea)

Author keywords

FIB; FIB CVD; Microfabrication; Sputtering

Indexed keywords

CHEMICAL VAPOR DEPOSITION; IONS; MICROFABRICATION; SCANNING; SPUTTERING;

BEAM SCANNING; FIB-CVD; OPTIMIZATION PARAMETER; PATTERN ACCURACY; SCANNING AREA; SCANNING TIME; SPUTTERING EFFECTS; SUBMICROMETERS;

ION BEAMS;

EID: 33846317480     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.291-292.413     Document Type: Conference Paper

References (8)

1. J.S. Ro, C.V. Thompson, and J. Melngailis : J. Vac. Sci, Technol. B 12(1994), No. 1, pp. 73-77.
2. J. Mohr and R. Oviedo : ISTFA, November(1993), pp.391-396.
3. A.D. Dubner : Doctoral Thesis, Massachusetts Institute of Technology(1990).
4. J. Fujita, M. Ishida, T. Ichihashi, Y. Ochiai, T. Kaito, S. Matsui : Nucl. Inst. and Methods in Physics Res., B 206(2003), pp. 472-477.
5. K. Watanabe, T. Morita, and R. kometani : J. Vac. Sci. Technol. B 22(2004), No. 1, pp.22-26.
6. R. Kometani, T. Morita, and K. Watanabe : J. Vac. Sci. Technol., B 22(2004), No. 1, pp.257-263.
7. T. Morita, K. Watanabe et al. : Jpn. J. Appl. Phys., Vol. 41(2002), pp.4425-4426.
8. Koh, Y.B., K. Gamo and S. Namba, "Characteristics of W films formed by ion beam assisted deposition", J. Vac. Sci. Technology, 1991, B 9(5), pp.2648-2652.