Graded SiOxNy layers as antireflection coatings for solar cells application

Materials Science- Poland

Volumn 24, Issue 4, 2006, Pages 1009-1016

  Lipinski M ^a   Kluska, S ^b   Czternastek, H ^b   Zieba P ^a  

^a INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Poland)

^b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Antireflection coating; Graded refractive index; Oxynitride

Indexed keywords

GRADIENT INDEX OPTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA; SILICON NITRIDE; SILICON SOLAR CELLS;

BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION; CONCENTRATION PROFILES; OXYNITRIDES; SURFACE PASSIVATION;

ANTIREFLECTION COATINGS;

EID: 33846292932     PISSN: 01371339     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (8)

1. CHEN Z. AND ROCHATGI A., Proc. 1st WCPEC, Hawaii, 1994, p. 1331.
2. LIPIŃSKI M., ZIȨBA P., JONAS S., KLUSKA S., SOKOŁOWSKI M., CZTERNASTEK H., Opto-Electr. Rev., 12 (2004), 41.
3. MAHDJOUB A., ZIGHED L., Thin Solid Films, 478 (2005), 299.
4. THEISS W., SCOUT version 2.3, web: www.mtheiss.com.
5. SNYDER P.G., XIONG Y.-M., WOOLAM J.A., AL-JUMAILY G.A., GAGLIARDI F. J., J. Vac. Sci. Technol., A10 (1992), 1462.
6. BRUGGEMAN A. G., Ann. Phys. (Leipzig), 24 (1935), 636.
7. BASORE P.A., CLUGSTON D.A., PC-ID vers.5.4, web: www.pv.unsw.edu.au.
8. NAGEL H., ABERLE A.G., HEZEL R., Prog. Photovolt.: Res. Appl., 7 (1999), 245.