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Volumn 2, Issue , 2003, Pages 1675-1678

Fast wet anisotropic etching of Si{100} and {110} with a smooth surface in ultra-high temperature KOH solutions

Author keywords

Anisotropic magnetoresistance; Production systems; Rough surfaces; Silicon; Surface morphology; Surface roughness; Temperature distribution; Temperature sensors; Waste management; Wet etching

Indexed keywords

ACTUATORS; ANISOTROPY; ARRHENIUS PLOTS; BOILING POINT; ENHANCED MAGNETORESISTANCE; MICROSYSTEMS; SILICON; SOLID-STATE SENSORS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; TEMPERATURE DISTRIBUTION; TEMPERATURE SENSORS; TRANSDUCERS; WASTE MANAGEMENT; WET ETCHING;

EID: 33846233323     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2003.1217105     Document Type: Conference Paper
Times cited : (9)

References (6)
  • 1
    • 0035648684 scopus 로고    scopus 로고
    • EMSi-microwave enhanced fast deep anisotropic etching of silicon for MEMS
    • J. Dziuban and R. Walczak, " EMSi-microwave enhanced fast deep anisotropic etching of silicon for MEMS," Sensors and Materials, 13, 41, (2001).
    • (2001) Sensors and Materials , vol.13 , pp. 41
    • Dziuban, J.1    Walczak, R.2
  • 2
    • 84944716522 scopus 로고    scopus 로고
    • Microwave enhanced wet anisotropic etching of silicon utilizing a memory effect of KOH activation - A remote E2MSi process
    • J. Dziuban and R. Walczak, " Microwave enhanced wet anisotropic etching of silicon utilizing a memory effect of KOH activation - a remote E2MSi process", Proc. of EUROSENSORS XVI, 437, (2002).
    • (2002) Proc. of EUROSENSORS XVI , pp. 437
    • Dziuban, J.1    Walczak, R.2
  • 3
    • 0031322482 scopus 로고    scopus 로고
    • In situ ultrasonic-assisted etching of '100' Si wafers by KOH
    • V. Karanassios, J. T. Sharples and A. Nathan "In situ ultrasonic-assisted etching of '100' Si wafers by KOH", Sensors and Materials, 9, 427, (1997).
    • (1997) Sensors and Materials , vol.9 , pp. 427
    • Karanassios, V.1    Sharples, J.T.2    Nathan, A.3
  • 6
    • 0035888040 scopus 로고    scopus 로고
    • Micro-morphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH: Velocity source forests
    • E. van Veenendaal, K.Sato, M.Shikida, A. J. Nijdam andJ. van Suchtelen, "Micro-morphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH : velocity source forests," Sensors and Actuators A, 93, 232, (2001).
    • (2001) Sensors and Actuators A , vol.93 , pp. 232
    • Van Veenendaal, E.1    Sato, K.2    Shikida, M.3    Nijdam, A.J.4    Van Suchtelen, J.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.