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Volumn 2, Issue , 2003, Pages 1675-1678
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Fast wet anisotropic etching of Si{100} and {110} with a smooth surface in ultra-high temperature KOH solutions
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Author keywords
Anisotropic magnetoresistance; Production systems; Rough surfaces; Silicon; Surface morphology; Surface roughness; Temperature distribution; Temperature sensors; Waste management; Wet etching
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Indexed keywords
ACTUATORS;
ANISOTROPY;
ARRHENIUS PLOTS;
BOILING POINT;
ENHANCED MAGNETORESISTANCE;
MICROSYSTEMS;
SILICON;
SOLID-STATE SENSORS;
SURFACE MORPHOLOGY;
SURFACE ROUGHNESS;
TEMPERATURE DISTRIBUTION;
TEMPERATURE SENSORS;
TRANSDUCERS;
WASTE MANAGEMENT;
WET ETCHING;
ACTIVATION PROCESS;
ETCHING CHARACTERISTICS;
KOH CONCENTRATION;
LOWER TEMPERATURES;
PRODUCTION SYSTEM;
ROUGH SURFACES;
ULTRAHIGH TEMPERATURE;
WET ANISOTROPIC ETCHING;
ANISOTROPIC ETCHING;
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EID: 33846233323
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SENSOR.2003.1217105 Document Type: Conference Paper |
Times cited : (9)
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References (6)
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