Preparation and microstructure of tantalum nitride thin film by cathodic arc deposition

Chinese Physics Letters

Volumn 23, Issue 11, 2006, Pages

  Li, Li ^a,b   Niu, Er Wu ^a   Lv, Guo Hua ^a   Feng, Wen Ran ^a   Gu, Wei Chao ^a   Chen, Guang Liang ^a   Zhang, Gu Ling ^a   Fan, Song Hua ^a   Liu, Chi Zi ^a   Yang, Si Ze ^a  

^a INSTITUTE OF PHYSICS   (China)

^b CIVIL AVIATION UNIVERSITY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; FILM PREPARATION; MICROSTRUCTURE; SUBSTRATES; SURFACE MORPHOLOGY; VACUUM APPLICATIONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC ARC DEPOSITION; CATHODIC VACUUM ARC TECHNIQUE; CRYSTAL COMPOSITION; CRYSTAL SURFACES; CRYSTALS STRUCTURES; SUBSTRATE BIAS; TANTALUM NITRIDES; TANTALUM-NITRIDE FILM; THIN-FILMS; X-RAY PHOTOELECTRONS;

THIN FILMS;

EID: 33846166797     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/11/037     Document Type: Article

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