A five mask CMOS LTPS process with LDD and only one ion implantation step

Proceedings of International Meeting on Information Display

Volumn 2006, Issue , 2006, Pages 1645-1648

  Schalberger, Patrick ^a   Persidis, Efstathios ^a   Fruehauf, Norbert ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC INVERTERS; ION IMPLANTATION; OSCILLATORS (ELECTRONIC); PHOTOLITHOGRAPHY; SEMICONDUCTOR DOPING; SHIFT REGISTERS;

PHOTOLITHOGRAPHIC MASKS; RING OSCILLATORS;

CMOS INTEGRATED CIRCUITS;

EID: 33846165074     PISSN: 17387558     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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3. H. Baur, S. Jelting, N. Benson, N. Frühauf, Journal of the SID 2006, p. 119-126.
4. C. Prat, M. Stehlé, D. Zahorski, Soc. Inform. Display Dig. 1999, p. 298-301.
5. C.-W. Lin, C.-H. Tseng, T.-K. Chang, C.-W. Lin, W.-T. Wang, H.-C. Cheng, IEEE Electron Device Letters, Vol. 23 2002, No. 3, p. 133-135