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Volumn 2006, Issue , 2006, Pages 1539-1543
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38.1: Invited paper: Roll-to-roll fabrication of active-matrix backplanes using self-aligned imprint lithography (SAIL)
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Author keywords
[No Author keywords available]
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Indexed keywords
NANOTECHNOLOGY;
PHOTOLITHOGRAPHY;
PRECISION ENGINEERING;
PRINTED CIRCUIT BOARDS;
THROUGHPUT;
ACTIVE MATRIX (AM);
R2R FABRICATION;
SELF-ALIGNED IMPRINT LITHOGRAPHY (SAIL);
THIN FILM TRANSISTORS;
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EID: 33846136741
PISSN: 17387558
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (13)
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References (7)
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