Fabrication of third order Bragg gratings by UV nanoimprint lithography for optofluidic lasers

LEOS Summer Topical Meeting

Volumn , Issue , 2006, Pages 62-63

  Peroz, C ^a   Galas, J C ^a   Shi, J ^b   LeGratiet, L ^a   Chen, Y ^a,b  

^a CNRS   (France)

^b ECOLE NORMALE SUPÉRIEURE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER IMPRINTING; MICROFLUIDIC CHIP; OPTOFLUIDIC DEVICES;

LASERS; MICROFLUIDICS; NANOIMPRINT LITHOGRAPHY; POLYDIMETHYLSILOXANE; REACTIVE ION ETCHING; THIN FILMS;

BRAGG GRATINGS;

LASERS; LITHOGRAPHY;

EID: 33846127862     PISSN: 10994742     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/LEOSST.2004.1338759     Document Type: Conference Paper

References (9)

1. Erickson, D.; Heng, X.; Li, Z., Rockwood, T.; Emery, T.; Zhang, Z.; Scherer, A.; Yang, C.; Psaltis, D. Proceedings of SPIE Optics and Photonics Special Session on Optofluidics. San Diego, CA 2005
2. Verpoorte, E. Lab Chip 2003, 3, 42N
3. Haisma, J.; Verheijen, M.; Heuvel, K.v.D.; Berg, J.v.D. J. Vac. Sci. Technol. B 1996, 14, 4124.
4. http://public.itrs.net/: International Technology Roadmap for Semiconductors (ITRS 2003 Edition)
5. Roy, E.; Kanamori, Y.; Belotti, M.; Chen, Y. Microelectron. Eng. 2005, 78/79, 689.
6. Galas, J.C.; Torres, J.; Belotti, M.; Kou, Q. Appl. Phys. Let. 2005, 86, 264101.
7. S. J. Orfanidis Electromagnetic Waves and Antennas book revised in 2004, Chap 5, http://www.ece.rutgers.edu/orfanidi/ewa/
8. Li, Z.; Zhang, Z.; Emery, T.; Scherer, A.; Psaltis, D. Optics Express 2006, 14, 696.
9. Baslev, B.; Kristensen, A. Optics Express 2005, 13, 344.