Resin-supported acid- and base-catalyzed one-pot sequential reaction including an enantioselective step

Tetrahedron Letters

Volumn 48, Issue 6, 2007, Pages 985-987

  Akagawa, Kengo ^a   Sakamoto, Seiji ^a   Kudo, Kazuaki ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACID; BASE; POLACRILIN; RESIN;

ALDOL REACTION; ARTICLE; CATALYSIS; CHEMICAL STRUCTURE; ENANTIOSELECTIVITY; ONE POT SYNTHESIS; SEQUENTIAL ANALYSIS;

EID: 33846109574     PISSN: 00404039     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tetlet.2006.12.008     Document Type: Article

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16. +-form) was soaked with 1 N aqueous HCl and then collected by filtration. Soaking and filtration was repeated one more time. It was then thoroughly washed with water and dried under reduced pressure.
17. R = 42.0 min).