Interface structure between epitaxial NiSi2 and Si

Journal of University of Science and Technology Beijing: Mineral Metallurgy Materials (Eng Ed)

Volumn 13, Issue 6, 2006, Pages 558-563

  Liu, Wei Long ^a   Chen, Wen Jauh ^b   Tsai, Ting Kan ^a   Tsai, Hsun Heng ^b   Hsieh, Shu Huei ^a  

^a Formosa University   (Taiwan)

^b NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

atomic structure; high resolution; image simulation; interface; nickel silicide

Indexed keywords

COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; INTERFACES (MATERIALS); NICKEL; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

COMPUTER IMAGE SIMULATION; INTERFACE STRUCTURE; NICKEL SILICIDE;

EPITAXIAL GROWTH;

EID: 33845893052     PISSN: 10058850     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1005-8850(06)60113-8     Document Type: Article

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