Epitaxial semimetallic Hf xZr 1-xB 2 templates for optoelectronic integration on silicon

Applied Physics Letters

Volumn 89, Issue 24, 2006, Pages

  Roucka, Radek ^a   An, YuJin ^a   Chizmeshya, Andrew V G ^a   Tolle, John ^a   Kouvetakis, John ^a   D'Costa, Vijay R ^a   Menéndez, José ^a   Crozier, Peter ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC CONSTANTS; EPITAXIAL SEMIMETALLIC TEMPLATES; FILM STRUCTURES; STRAIN COMPENSATION;

HAFNIUM ALLOYS; INTEGRATED OPTOELECTRONICS; OPTICAL PROPERTIES; SILICON; TENSILE STRENGTH; THERMOELASTICITY;

EPITAXIAL GROWTH;

EID: 33845804776     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2403189     Document Type: Article

References (10)

1. S. S. Ng, Z. Hassan, G. L. Chew, M. R. Hashim, and M. E. Kordesch, Journal of Physical Sciences 15, 97 (2004).
2. J. Tolle, R. Roucka, I. S. T. Tsong, C. Ritter, P. A. Crozier, A. V. G. Chizmeshya, and J. Kouvetakis, Appl. Phys. Lett. 82, 2398 (2003).
3. J. Tolle, J. Kouvetakis, D. W. Kim, S. Mahajan, A. Bell, F. A. Ponce, I. S. T. Tsong, M. L. Kottke, and Z. D. Chen, Appl. Phys. Lett. 84, 3510 (2004).
4. R. Armitage, J. Suda, and T. Kimoto, Phys. Status Solidi C 2, 2191 (2005).
5. J. K. Dewhurst, S. Sharma, and C. Ambrosch-Draxl, EXCITING FPLAPW code, Version 0.9.57, 2006.
6. C. Ambrosch-Draxl and J. O. Sofo, Comput. Phys. Commun. 175, 1 (2006).
7. G. Kresse and J. Furthmüller, Phys. Rev. B 0163-1829 10.1103/PhysRevB.54.11169 54, 11169 (1996); G. Kresse and J. Furthmüller, Comput. Mater. Sci. 6, 15 (1996).
8. G. Kresse and J. Furthmüller, Phys. Rev. B 0163-1829 10.1103/PhysRevB.54.11169 54, 11169 (1996); G. Kresse and J. Furthmüller, Comput. Mater. Sci. 6, 15 (1996).
9. L. Fast, J. M. Wills, B. Johannson, and O. Eriksson, Phys. Rev. B 51, 17431 (1995).
10. S. Jayaraman, J. E. Gerbi, Y. Yang, D. Y. Kim, A. Chatterjee, P. Bellon, G. S. Girolami, J. P. Chevalier, and J. R. Abelson, Surf. Coat. Technol. 200, 6629 (2006).