Optimized energy coupling at ultrafast laser-irradiated metal surfaces by tailoring intensity envelopes: Consequences for material removal from Al samples

Physical Review B - Condensed Matter and Materials Physics

Volumn 74, Issue 22, 2006, Pages

  Colombier, J P ^a   Combis, P ^b   Rosenfeld, A ^c   Hertel, I V ^c,d   Audouard, E ^a   Stoian, R ^a  

^a UNIVERSITÉ JEAN MONNET   (France)

^b CEA DAM DIF   (France)

^c MAX BORN INSTITUT   (Germany)

^d FREIE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845663633     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.74.224106     Document Type: Article

References (76)

1. B. N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, and A. Tünnermann, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 63, 109 (1996).
2. A. Semerok, C. Chaléard, V. Detalle, J.-L. Lacour, P. Mauchien, P. Meynadier, C. Nouvellon, B. Sallé, P. Palianov, M. Perdrix, and G. Petite, Appl. Surf. Sci. ASUSEE 0169-4332 138-139, 311 (1999).
3. J. Hohlfeld, S.-S. Wellershoff, J. Güdde, U. Conrad, V. Jähnke, and E. Matthias, Chem. Phys. CMPHC2 0301-0104 10.1016/S0301-0104(99)00330-4 251, 237 (2000).
4. D. J. Funk, D. S. Moore, S. D. McGrane, J. H. Reho, and R. L. Rabie, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s00339-005-3214-4 81, 295 (2005).
5. K. T. Gahagan, D. S. Moore, D. J. Funk, R. L. Rabie, S. J. Buelow, and J. W. Nicholson, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.85.3205 85, 3205 (2000).
6. Ph. Rohwetter, J. Yu, G. Méjean, K. Stelmaszczyk, E. Salmon, J. Kasparian, J.-P. Wolf, and L. Wöste, J. Anal. At. Spectrom. JASPE2 0267-9477 10.1039/b316343a 19, 437 (2004).
7. Y. Okano, H. Kishimura, Y. Hironaka, K. Nakamura, and K. Kondo, Appl. Surf. Sci. ASUSEE 0169-4332 197-198, 281 (2002).
8. D. Grojo, J. Hermann, and A. Perrone, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1861519 97, 063306 (2005).
9. J. König, S. Nolte, and A. Tünnermann, Opt. Express OPEXFF 1094-4087 10.1364/OPEX.13.010597 13, 10597 (2005).
10. M. Ye and C. P. Grigoropoulos, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1360696 89, 5183 (2001).
11. O. Albert, S. Roger, Y. Glinec, J. C. Loulergue, J. Etchepare, C. Boulmer-Leborgne, J. Perrière, and E. Millon, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s00339-002-1815-8 76, 319 (2003).
12. R. Teghil, L. D'Alession, A. Santagata, M. Zaccagnino, D. Ferro, and D. J. Sordelet, Appl. Surf. Sci. ASUSEE 0169-4332 10.1016/S0169-4332(03)00082-5 210, 307 (2003).
13. S. Amoruso, G. Ausanio, A. C. Barone, R. Bruzzese, L. Gragnaniello, M. Vitiello, and X. Wang, J. Phys. B JPAPEH 0953-4075 10.1088/0953-4075/38/20/L01 38, L329 (2005).
14. N. Benchikh, F. Garrelie, C. Donnet, K. Wolski, R. Y. Fillit, F. Rogemond, J. L. Subtil, J. N. Rouzaud, and J. Y. Laval, Surf. Coat. Technol. SCTEEJ 0257-8972 200, 6272 (2006).
15. T. E. Glover, J. Opt. Soc. Am. B JOBPDE 0740-3224 20, 125 (2003).
16. S. Eliezer, N. Eliaz, E. Grossman, D. Fisher, I. Gouzman, Z. Henis, S. Pecker, Y. Horovitz, M. Fraenkel, S. Maman, and Y. Lereah, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.69.144119 69, 144119 (2004).
17. R. Le Harzic, N. Huot, E. Audouard, C. Jonin, P. Laporte, S. Valette, A. Fraczkiewicz, and R. Fortunier, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1481195 80, 3886 (2002).
18. A. Y. Vorobyev and C. Guo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1844598 86, 011916 (2005).
19. P. B. Corkum, F. Brunel, N. K. Sherman, and T. Srinivasan-Rao, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.61.2886 61, 2886 (1988).
20. E. G. Gamaly, A. V. Rode, B. Luther-Davies, and V. T. Tikhonchuk, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1447555 9, 949 (2002).
21. A. P. Kanavin, I. V. Smetanin, V. A. Isakov, Yu. V. Afanasiev, B. N. Chichkov, B. Wellegehausen, S. Nolte, C. Momma, and A. Tünnermann, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.57.14698 57, 14698 (1998).
22. R. S. Judson and H. Rabitz, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.68.1500 68, 1500 (1992).
23. D. Meshulach and Y. Silberberg, Nature (London) NATUAS 0028-0836 10.1038/24329 396, 239 (1998).
24. A. Assion, T. Baumert, M. Bergt, T. Brixner, B. Kiefer, V. Seyfried, M. Strehle, and G. Gerber, Science SCIEAS 0036-8075 10.1126/science.282.5390.919 282, 919 (1998).
25. A. Lindinger, C. Lupulescu, M. Plewicki, F. Vetter, A. Merli, S. M. Weber, and L. Wöste, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett. 93.033001 93, 033001 (2004).
26. A. M. Weiner, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.1150614 71, 1929 (2000).
27. R. Stoian, Ph.D. thesis, Free University Berlin, 2000.
28. M. M. Wefers and K. A. Nelson, J. Opt. Soc. Am. B JOBPDE 0740-3224 12, 1343 (1995).
29. T. Tanabe, F. Kannari, F. Korte, J. Koch, and B. Chichkov, Appl. Opt. APOPAI 0003-6935 10.1364/AO.44.001092 44, 1092 (2005).
30. H. Varel, M. Wähmer, A. Rosenfeld, D. Ashkenasi, and E. E. B. Campbell, Appl. Surf. Sci. ASUSEE 0169-4332 127-129, 128 (1998).
31. R. Stoian, A. Mermillod-Blondin, N. M. Bulgakova, A. Rosenfeld, I. V. Hertel, M. Spyridaki, E. Koudoumas, P. Tzanetakis, and C. Fotakis, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2053355 87, 124105 (2005).
32. D. Perez and L. J. Lewis, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.67.184102 67, 184102 (2003).
33. P. Lorazo, L. J. Lewis, and M. Meunier, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.91.225502 91, 225502 (2003).
34. A. Bartelt, Ph.D. thesis, Freie Universität Berlin, 2002.
35. L. V. Zhigilei and B. J. Garrison, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.119606 71, 551 (1997).
36. X. Y. Wang and M. C. Downers, Opt. Lett. OPLEDP 0146-9592 17, 1450 (1992).
37. A. Semerok and C. Dutouquet, Thin Solid Films THSFAP 0040-6090 453-454, 501 (2004).
38. B. Rethfeld, K. Sokolowski-Tinten, D. von der Linde, and S. I. Anisimov, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.65.092103 65, 092103 (2002).
39. H. Ki, P. S. Mohanty, and J. Mazumder, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/34/3/320 34, 364 (2001).
40. C. Schäfer, H. M. Urbassek, and L. V. Zhigilei, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.66.115404 66, 115404 (2002).
41. T. E. Itina, J. Hermann, Ph. Delaporte, and M. Sentis, Thin Solid Films THSFAP 0040-6090 453-454, 513 (2004).
42. P. Lorazo, L. J. Lewis, and M. Meunier, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.73.134108 73, 134108 (2006).
43. A. V. Bushman, I. V. Lomonosov, and V. E. Fortov, Sov. Technol. Rev. B STBREJ 0892-6808 5, 1 (1993).
44. S. Fähler, M. Störmer, and H. U. Krebs, Appl. Surf. Sci. ASUSEE 0169-4332 109-110, 433 (1997).
45. N. Seifert, G. Betz, and W. Husinsky, Appl. Surf. Sci. ASUSEE 0169-4332 103, 63 (1996).
46. I. Weaver and C. L. S. Lewis, Appl. Surf. Sci. ASUSEE 0169-4332 96-98, 663 (1996).
47. A. V. Bulgakov, I. Ozerov, and W. Marine, Thin Solid Films THSFAP 0040-6090 453-454, 557 (2004).
48. S. H. Jeong, R. Greif, and R. E. Russo, Appl. Surf. Sci. ASUSEE 0169-4332 127-129, 177 (1998).
49. N. Y. Bykov, N. M. Bulgakova, A. V. Bulgakov, and G. A. Loukianov, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 79, 1097 (2004).
50. A. Miotello and R. Kelly, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.114912 67, 3535 (1995).
51. J. P. Colombier, P. Combis, F. Bonneau, R. Le Harzic, and E. Audouard, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.71.165406 71, 165406 (2005).
52. S.-S. Wellershoff, J. Hohlfeld, J. Güdde, and E. Matthias, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s003390051362 69, S99 (1999).
53. M. I. Kaganov, I. M. Lifshitz, and L. V. Tanatarov, Zh. Eksp. Teor. Fiz. ZETFA7 0044-4510 31, 232 (1956)
54. M. I. Kaganov, I. M. Lifshitz, and L. V. Tanatarov, [Sov. Phys. JETP SPHJAR 0038-5646 4, 173 (1957)].
55. S. I. Anisimov, B. Kapeliovich, and T. L. Perel'man, Zh. Eksp. Teor. Fiz. ZETFA7 0044-4510 66, 776 (1974)
56. S. I. Anisimov, B. Kapeliovich, and T. L. Perel'man, [Sov. Phys. JETP SPHJAR 0038-5646 39, 375 (1974)].
57. N. K. Sherman, F. Brunel, P. B. Corkum, and F. A. Hegmann, Opt. Eng. OPEGAR 0091-3286 28, 1114 (1989).
58. P. Celliers and A. Ng, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.47. 3547 47, 3547 (1993).
59. R. W. Schoenlein, W. Z. Lin, J. G. Fujimoto, and G. L. Eesley, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.58.1680 58, 1680 (1987).
60. V. E. Gusev and O. B. Wright, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.57.2878 57, 2878 (1998).
61. D. Bejan and G. Raseev, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.55.4250 55, 4250 (1997).
62. W. Ebeling, A. Förster, V. Fortov, V. Griaznov, and A. Polishchuk, Thermophysical Properties of Hot Dense Plasmas (Teubner, Stuttgart, 1991).
63. E. Palik, Handbook of Optical Constants of Solids (Academic, London, 1985).
64. P. Drude, Ann. Phys. ANPYA2 0003-3804 1, 566 (1900).
65. P. L. Silvestrelli, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.60. 16382 60, 16382 (1999).
66. D. Fisher, M. Fraenkel, Z. Henis, E. Moshe, and S. Eliezer, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.65.016409 65, 016409 (2001).
67. N. W. Ashcroft and K. Sturm, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.3.1898 3, 1898 (1971).
68. S. Krishnan and P. C. Nordine, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.47.11780 47, 11780 (1993).
69. H. M. Milchberg, R. R. Freeman, S. C. Davey, and R. M. More, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.61.2364 61, 2364 (1988).
70. Y. B. Zel'dovich and O. M. Todes, Zh. Eksp. Teor. Fiz. ZETFA7 0044-4510 10, 1441 (1940).
71. K. Sokolowski-Tinten, J. Bialkowski, A. Cavalleri, D. von der Linde, A. Oparin, J. Meyer-ter-Vehn, and S. I. Anisimov, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.81.224 81, 224 (1998).
72. A. M. Komashko, M. D. Feit, A. M. Rubenchik, M. D. Perry, and P. S. Banks, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/ s003390051361 69, Suppl. S95 (1999).
73. This behavior can be attributed to the electron-ion energy relaxation occurring during the expansion of the hot electron gas. The electron-phonon coupling constant depends strongly on the electronic structure and its value is known with low accuracy at standard conditions. The linear dependence with the difference in the electron and the ion temperature is supposed to be valid for a weak variation at solid density. For lower densities, the plasma model should be applied but the extension of this model to high densities is not self-consistent with the solid model and leads to an overestimation of the coupling coefficient [see, e.g., A. Ng, A. Forsman, and P. Celliers, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.51.R5208 51, R5208 (1995)]. To avoid increasing the complexity in our simulations, the electron-phonon coupling constant is left as a parameter with a constant value. If this assumption is acceptable during the quasi-isochoric heating, its accuracy may be doubtful during gas expansion (when insulating phases may appear). This fact is responsible for thermodynamic paths where the maximum temperature is reached at a density lower than the one corresponding to the critical point. However, this uncertainty on the thermalization time concerns few cells, as the external one at 0.25 nm in Figs. 10 11, and we suppose that the global thermodynamic behavior of the material is reasonable.
74. N. M. Bulgakova, I. M. Bourakov, and N. A. Bulgakova, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.63.046311 63, 046311 (2001).
75. S. Petzoldt, J. Reif, and E. Matthias, Appl. Surf. Sci. ASUSEE 0169-4332 96-98, 199 (1996).
76. F. Vidal, T. W. Johnston, S. Laville, O. Barthélemy, M. Chaker, B. Le Drogoff, J. Margot, and M. Sabsabi, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.86.2573 86, 2573 (2001).