Aspects of particulate production from metals exposed to pulsed laser radiation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 663-667

  Weaver, I ^a   Lewis, C L S ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; COPPER; DEPOSITION; OPTICAL GLASS; PARTICLES (PARTICULATE MATTER); PARTICULATE EMISSIONS; PROBABILITY; RADIATION; SUBSTRATES; SURFACES; VACUUM;

ABLATED MATERIAL; ATOMIC FLUXES; BOLZMANN PROBABILITY DISTRIBUTIONS; CONCAVE MYLAR SUBSTRATES; LASER POWER DENSITY THRESHOLD; PARTICULATE FLUXES; PARTICULATE NUMBER DENSITIES; PARTICULATE PRODUCTION; PARTICULATE SIZE DISTRIBUTIONS; PULSED LASER RADIATION;

LASER ABLATION;

EID: 0030563115     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00594-3     Document Type: Article

References (5)

1. J.T. Cheung and H. Sankur, CRC Crit. Rev. Solid State Mater. Sci. 15 (1988) 63.
2. D.B. Chrisey and G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994).
3. D. Lubben, S.A. Barnett, K. Suzuki, S. Gorbatkin and J.E. Greene, J. Vac. Sci. Technol. B 3 (1985) 968.
4. H. Dupendant, J.P. Gavigan, D. Givord, A. Lienard, J.P. Rebouillat and Y. Souche, Appl. Surf. Sci. 43 (1989) 369.
5. V.N. Kondrat'ev, Zh. Prikladnoi Mekh. i Tekhn. Fiz. 5 (1972) 49. (Transl. by Plenum, New York.)