Patterning of two-dimensional photonic crystal structures by nanoimprint lithography

International Journal of Nanoscience

Volumn 5, Issue 4-5, 2006, Pages 559-563

  Chen, A ^a   Wang, B Z ^b   Chua, S J ^b   Wilhelmi, O ^a   Mahmood, Shahrain B ^a   Saw, B T ^a   Kong, J R ^a   Moser, H O ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Nanoimprint lithography; Photonic crystals

Indexed keywords

CRYSTAL STRUCTURE; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; FABRICATION; GLASS TRANSITION; MOLDS; POLYMETHYL METHACRYLATES; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY; PHOTONIC CRYSTALS; PROCESS PARAMETERS; SILICON SUBSTRATES;

NANOTECHNOLOGY;

EID: 33845634340     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0219581x06004796     Document Type: Conference Paper

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