Laser assisted particle removal 'dry' cleaning of critical surfaces

Materials Science and Engineering B

Volumn 49, Issue 2, 1997, Pages 85-88

  Allen, S D ^a   Miller, A S ^b   Lee, S J ^c  

^a FLORIDA STATE UNIVERSITY   (United States)

^b Xontech Incorporated   (United States)

^c NATIONAL PINGTUNG UNIVERSITY   (Taiwan)

Author keywords

Laser processing; Silicon processing; Surface contamination

Indexed keywords

LASER APPLICATIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES; SURFACE CLEANING;

LASER PROCESSING; SURFACE CONTAMINATION;

LASER ABLATION;

CLEANING; PARTICLE; REMOVAL;

EID: 0031229532     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01884-3     Document Type: Article

References (3)

1. K. Imen, S.J. Lee and S.D. Allen, Appl. Phys. Lett., 58 (2) (1991) 203; U.S. Patent 429,026 (1991).
2. W. Zapka, W. Ziemlich and A.C. Tam, Appl. Phys. Lett., 58 (20) (1991) 2217.
3. S.J. Lee, K. Imen and S.D. Allen, Appl. Phys. Left., 61 (19) (1992) 2314.