Influence of rapid thermal process on the structure and properties of Ni-Cr thin-films fabricated by ion beam sputtering

Zhongnan Daxue Xuebao (Ziran Kexue Ban)/Journal of Central South University (Science and Technology)

Volumn 37, Issue 5, 2006, Pages 837-840

  Zhou, Ji Cheng ^a   Yan, Jian Wu ^a,b   Tian, Li ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

^b NANCHANG HANGKONG UNIVERSITY   (China)

Author keywords

Ion beam sputtering technology; Ni Cr alloy thin films; Rapid thermal process

Indexed keywords

AMORPHOUS FILMS; CRYSTALLINE MATERIALS; ELECTRON MICROSCOPES; FABRICATION; SURFACE TOPOGRAPHY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ION BEAM SPUTTERING TECHNOLOGY; NI CR ALLOY THIN FILMS; RAPID THERMAL PROCESS;

ION BEAMS;

EID: 33845524434     PISSN: 16727207     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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