Microstructure effect on microtopography of chemically etched α + β Ti alloys

Applied Surface Science

Volumn 253, Issue 2, 2006, Pages 449-458

  Lim, P Y ^a,b   She, P L ^b   Shih, H C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Chemical etching; Immersion test; Profilometry; Roughness; SEM; Titanium

Indexed keywords

ETCHING; MICROSTRUCTURE; OPTICAL MICROSCOPY; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TITANIUM;

CHEMICAL ETCHING; IMMERSION TEST; MICROTOPOGRAPHY; THICKNESS REDUCTION RATE;

TITANIUM ALLOYS;

EID: 33845396023     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.12.107     Document Type: Article

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