Quantitative photothermal characterization of ion-implanted layers in Si

Journal of Applied Physics

Volumn 91, Issue 5, 2002, Pages 2874-2882

  Salnick, Alex ^a   Opsal, Jon ^a  

^a Therma Wave Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845386514     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448410     Document Type: Article

References (34)

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